CLEAN ROOM

1000 m2 of total surface. House in house structure. Class 100-10,000 depending on areas. Air control (T= 21ºC±1ºC) and humidity (40%±5%). D.I. water system (18 Mohm.cm) 28 m3/day, maximum flow: 1.6 m3/hour. Ultrapure gas distribution. Power supply: 25 kV and 3000 kVA. Waste treatment. Security system: gas detectors, fire and intruder protection.

Person responsible/contact: Ferran Xinxó (ferran.xinxo@cnm.es)


CLEAN ROOM EQUIPMENT
 
1.- Thermal processes and CVD equipment 
 
  
  • 11 tubular furnaces for oxidation, annealing and diffusion thermal processes
  • 3 LPCVD furnaces for poly and nitride deposition
  • 2 PECVD furnace for passivation layer deposition (oxide and nitride)
  • 1 APCVD furnace for doped oxide deposition.
 
 
 

 
2.- Ion Implantation equipment
 
  
  • 1 medium current implanter for B, P, As, N and Ar
 
 
 

 
3.- Metallisation equipment
 
 
  • 1 DC magnetron sputtering, manual loading, 1 cathode
  • 1 DC/RF sputtering, automatic loading, 4 independent cathodes
  • 1 Sputtering with 3 independent cathodes, automatic loading
  • 1 Sputtering with 3 independent cathodes, manual loading
  • 1 Sputtering with 1 DC cathode, manual loading
 

 
4.- Photolithographic equipment
 
  
  • 1 5:1 Stepper 0.8 µm resolution
  • 1 5:1 Stepper 0.5 µm resolution
  • Contact/proximity mask aligner
  • Double side contact/proximity mask aligner
  • 2 automatic tracks for photoresist deposition and developing
  • Mask cleaner
  • Manual spinner for photoresist deposition
  • Critical dimension measurement system
 
 
  
  
  
  
 

 
5.- Dry etching equipment
 
  
  • 1 manual RIE, one chamber
  • 1 hexode RIE
  • 1 automatic RIE with 4 chambers for Al, oxide, poly, nitride etching and photoresist removal
  • 2 plasma barrels
 
 
 

 
6.- Wet etching and cleaning equipment
 
  
  • 10 semiautomatic wet benches
  • 4 spinners for wafer rinse/drying
  • 1 bench for anisotropic etching
 
 
 

 
7.- In-line test equipment
 
  
  • 2 inspection microscopes
  • 1 sheet resistance measurement system
  • 1 profilemeter
  • 1 optical interferometer for dielectric thickness measurement
  • 1 Ellipsometer
  • 1 FT-IR spectrometer
 
 
  
  
 



 
Contact: Dt@cnm.es